Get Dry Etching Technology for Semiconductors PDF

By Kazuo Nojiri

This booklet is a must have connection with dry etching know-how for semiconductors, for you to allow engineers to increase new etching strategies for additional miniaturization and integration of semiconductor built-in circuits. The writer describes the machine production move, and explains within which a part of the circulation dry etching is really used. The content material is designed as a realistic advisor for engineers operating at chip makers, apparatus providers and fabrics providers, and collage scholars learning plasma, targeting the subjects they wish such a lot, akin to precise etching methods for every fabric (Si, SiO2, steel and so on) utilized in semiconductor units, etching apparatus utilized in production fabs, clarification of why a selected plasma resource and fuel chemistry are used for the etching of every fabric, and the way to advance etching processes. The most modern, key applied sciences also are defined, akin to 3D IC Etching, twin Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.

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Dry Etching Technology for Semiconductors by Kazuo Nojiri

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